• Job Description

  Req#: R-4651

  Onto Innovation is a leader in process control, combining global scale with an expanded portfolio of leading-edge technologies that include: 3D metrology spanning the chip from nanometer-scale transistors to micron-level die-interconnects; macro defect inspection of wafers and packages; metal interconnect composition; factory analytics; and lithography for advanced semiconductor packaging. Our breadth of offerings across the entire semiconductor value chain helps our customers solve their most difficult yield, device performance, quality, and reliability issues. Onto Innovation strives to optimize customers’ critical path of progress by making them smarter, faster and more efficient.

  Job Summary & Responsibilities

  Model Development & Validation:

  • Design, build, and optimize scatterometry and ellipsometry models to support Intel’s 18A node virtual fab process flows.

  • Perform sensitivity, parameter correlation, and residual analysis to ensure robust metrology performance.

  • Lead model qualification and handoff to global support teams and end customers.

  Customer Engagement & Technical Interface:

  • Serve as the primary modeling point-of-contact for Intel’s Virtual Fab engineers and stakeholders.

  • Facilitate technical deep dives, working sessions, and reviews to align modeling objectives and process requirements.

  • Translate customer feedback into actionable improvements and future modeling enhancements.

  Process & Documentation Excellence:

  • Maintain detailed documentation of model architecture, simulation setup, and fitting workflows.

  • Contribute to modeling knowledge base and internal process control libraries to improve reuse and scalability across programs.

  Technical Innovation & Enablement:

  • Support evaluation and integration of next-generation modeling features (e.g., AI/ML fitting, hybrid modeling workflows).

  • Mentor junior application scientists and field teams to scale modeling capability globally.

  Qualifications

  • PhD or MS in Physics, Electrical Engineering, Materials Science, or related field.
  • 5+ years of experience in optical modeling (scatterometry/OCD, ellipsometry, RCWA/FEM-based modeling) in semiconductor metrology.
  • Strong background in logic process flows (FinFET/GAA), film stack analysis, and parameter correlation.
  • Excellent communication and cross-functional collaboration skills; experience interfacing with customers in technical settings.
  • Experience supporting Tier 1 semiconductor fabs is highly desirable.

  Onto Innovation Inc. offers competitive salaries and a generous benefits package, including health/dental/vision/life/disability, PTO, 401K plan with employer match, and an Employee Stock Purchase Program (ESPP) along with health & wellness initiatives. We provide a collaborative working environment along with resources, and state-of-the-art tools & equipment to promote success; and a welcoming, inclusive corporate culture where individuals are recognized for their contributions.

  Onto Innovation Inc. is an Equal Opportunity Employer and all qualified applicants will receive consideration for employment without regard to race, color, religion, gender, sexual orientation, national origin, genetic information, age, disability, veteran status, or any other legally protected basis.

  For positions requiring access to technical data, Onto Innovation Inc., Inc. may have to obtain export licensing approval from the U.S. Department of Commerce - Bureau of Industry and Security and/or the U.S. Department of State - Directorate of Defense Trade Controls. As such, applicants for this position – except US Citizens, US Permanent Residents, and protected individuals as defined by 8 U.S.C. 1324b(a)(3) – may have to go through an export licensing review process.

• About the company

  Onto Innovation Inc. is an American semiconductor company formed in 2019 from the merger of Rudolph Technologies, Inc.

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